主要规格及技术指标

SEM 分辨率: Gemini 镜筒，采用高分辨率配置(最高探头电流20nA), 工作距离也最为适中:
30kV时，1.0nm (STEM模式)
15 kV时，1.0nm
1kV时，1.6nm
加速电压:范围:20V至30kV,可持续变化，每一步10V
探头电流: 20nA 高分辨率配置:3pA至20Na;100nA高电流配置:6pA至100nA
放大倍率:10x-2000000x
电子源灯丝:肖特基场发射体
物镜类型:Gemini电磁/静电物镜系统(80°锥体末级透镜)，用水冷却，确保最佳的热稳定性和再现性。
聚焦工作距离:在0.1mm到50 mm 之间。
最大扫描速度：50 ns/像素
图像帧存储：4:3 格式16 位动态范围
1024x768像素2048x1536 像素3072 x 2304 像素4096x 3072 像素6144 x 4608 像素8192x6144像素12288x9216 像素24576x18432像素32768x24576像素
移动: X/Y=125 mm ，z=50 m ，T=-10°至90° R= 360°
SEM resolution: Gemini tube, with a high-resolution configuration (maximum probe current of 20nA), The working distance is also the most moderate:
At 30kV, 1.0nm (STEM mode)
At 15 kV, 1.0nm
1.6nm at 1kV
Acceleration voltage: Range: 20V to 30kV, sustainable variation, 10V per step
Probe current: 20nA High resolution configuration: 3pA to 20Na; 100nA high current configuration: 6pA to 100nA
Magnification: 10x-2000000x
Electronic source filament: Schottky field emitter
Objective type: Gemini electromagnetic/electrostatic objective system (80 ° cone final lens), cooled with water to ensure optimal thermal stability and reproducibility.
Focusing working distance: between 0.1mm and 50mm.
Maximum scanning speed: 50 ns/pixel
Image frame storage: 4:3 format, 16 bit dynamic range
1024x768 pixels 2048x1536 pixels 3072 x 2304 pixels 4096 x 3072 pixels 6144 x 4608 pixels 8192x6144 pixels 12288x9216 pixels 24576x18432 pixels 32768x24576 pixels
Movement: X/Y=125 mm, z=50 m, T=-10 ° to 90 ° R=360 °

主要功能及特色

显微镜用聚焦电子射束彻底地扫描样品(SEM成像)，从而生成图像，或分析合适的样品。除了执行显微检查以外，显微镜还允许对合适的样品加以改动。为了这一目的，样品被放置在真空的样品室中。
该显微镜专为下列用途而设计:
成像:
通过扫描穿过样品的聚焦电子束，可以生成图像并分析样品。该应用程序可用来分析合适样品的表面结构和接近表面的结构。
分析:
使用可选配的 EDS 能谱仪，在聚焦电子束的位置上进行元素分析。使用可选配的EBSD探测器，分析晶体结构与方向。
A microscope uses a focused electron beam to thoroughly scan the sample (SEM imaging), generating images or analyzing suitable samples. In addition to performing microscopic examinations, the microscope also allows for modifications to suitable samples. For this purpose, the sample is placed in a vacuum sample chamber.
This microscope is designed specifically for the following purposes:
Imaging:
By scanning a focused electron beam passing through the sample, images can be generated and analyzed. This application can be used to analyze the surface structure and near surface structure of suitable samples.
Analysis:
Use an optional EDS spectrometer to perform elemental analysis at the position of the focused electron beam. Use an optional EBSD detector to analyze the crystal structure and orientation.

主要附件及配置

无