主要规格及技术指标

1.SEM 分辨率: Gemini 镜筒，采用高分辨率配置(最高探头电流20nA), 工作距离也最为适中:
30kV时，1.0nm (STEM模式)
15 kV时，1.0nm
1kV时，1.6nm
2.加速电压:范围:20V至30kV,可持续变化，每一步10V
3.探头电流: 20nA 高分辨率配置:3pA至20Na;100nA高电流配置:6pA至100nA
4.放大倍率:10x-2000000x
5.电子源灯丝:肖特基场发射体
6.物镜类型:Gemini电磁/静电物镜系统(80°锥体末级透镜)，用水冷却，确保最佳的热稳定性和再现性。
7.聚焦工作距离:在0.1mm到50 mm 之间。
8.最大扫描速度：50 ns/像素
9.图像帧存储：4:3 格式16 位动态范围
10.移动: X/Y=125 mm ，z=50 m ，T=-10°至90° R= 360°

1.SEM resolution: Gemini tube, with a high-resolution configuration (maximum probe current of 20nA), The working distance is also the most moderate:
At 30kV, 1.0nm (STEM mode)
At 15 kV, 1.0nm
1.6nm at 1kV
2.Acceleration voltage: Range: 20V to 30kV, sustainable variation, 10V per step
3.Probe current: 20nA High resolution configuration: 3pA to 20Na; 100nA high current configuration: 6pA to 100nA
4.Magnification: 10x-2000000x
5.Electronic source filament: Schottky field emitter
6.Objective type: Gemini electromagnetic/electrostatic objective system (80 ° cone final lens), cooled with water to ensure optimal thermal stability and reproducibility.
7.Focusing working distance: between 0.1mm and 50mm.
8.Maximum scanning speed: 50 ns/pixel
9.Image frame storage: 4:3 format, 16 bit dynamic range
10.Movement: X/Y=125 mm, z=50 m, T=-10 ° to 90 ° R=360 °

主要功能及特色

1. 扫描电镜采用聚焦电子射束扫描样品(SEM成像)，从而生成图像，分析样品。样品被放置在真空的样品室中。
该显微镜专为下列用途而设计:
成像:通过扫描穿过样品的聚焦电子束，可以生成图像并分析样品。
分析:可用来分析样品的表面结构和接近表面的结构。
2. 使用可选配的 EDS 能谱仪，在聚焦电子束的位置上进行元素分析。使用可选配的EBSD探测器，分析晶体结构与方向。

1. A microscope uses a focused electron beam to thoroughly scan the sample (SEM imaging), generating images or analyzing suitable samples. For this purpose, the sample is placed in a vacuum sample chamber.
This microscope is designed specifically for the following purposes:
Imaging:By scanning a focused electron beam passing through the sample, images can be generated and analyzed.
Analysis:This application can be used to analyze the surface structure and near surface structure of suitable samples.
2. Use an optional EDS spectrometer to perform elemental analysis at the position of the focused electron beam. Use an optional EBSD detector to analyze the crystal structure and orientation.

主要附件及配置

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