主要规格及技术指标

1. Measurement capability: Measure all 16 elements of the Muller matrix, Psi/Delta, NCS, R/T, Depolarization, and other spectra in one go
2. Spectral range: 210-1000nm
3. Spectral measurement interval: ＜ 0.8nm @ UV-VIS
4. Single point measurement time: ＜ 15s (user adjustable)
5. Spot size: 2-5mm in large spot mode, 100 in low spot mode μ M (eliminating reflection from the back of the double throw transparent substrate)
6. Micro area visual camera: equipped with observation and auxiliary search and positioning measurement of the target micro area
7. Laser leveling system: Symmetric reflection laser detection optical path positioning sample table tilt and elevation, assisting in leveling the maximum focal plane of the test sample
8. Modulation technology: Composite achromatic wave plate dual rotation PCr1SCr2A modulation technology
9. Incident angle range: 45-90 ° (5-degree step)
10. Sample stage: Supports Z-axis focusing and pitch adjustment, meeting the requirements φ Vacuum negative pressure adsorption fixed
测量能力：可一次性测量穆勒矩阵的全部 16 个元素、Psi/Delta、NCS、反射率 / 透射率（R/T）、退偏度等光谱参数。
光谱范围：210-1000nm
光谱测量间隔：紫外 - 可见光（UV-VIS）区域＜0.8nm
单点测量时间：＜15 秒（用户可调节）
光斑尺寸：
大光斑模式：2-5mm
小光斑模式：100μm（可消除双抛透明基底背面反射）
微区视觉相机：配备观察功能，辅助搜索并定位目标微区进行测量
激光调平系统：通过对称反射激光检测光路定位样品台倾斜与高度，辅助调平待测样品的最大焦平面
调制技术：复合消色差波片双旋转 PCr1SCr2A 调制技术
入射角范围：45-90°（以 5° 为步长）
样品台：支持 Z 轴聚焦与俯仰调节，满足 φ 真空负压吸附固定要求

主要功能及特色

SE-VM is an ultra high precision and fast measurement spectroscopic ellipsometer, which adopts independently developed ellipsometry innovation technology and has technologies such as 1 dual rotation compensator synchronous control technology and 2 transparent substrate anti backreflection technology. Rapid characterization and analysis of optical parameters for thin films and nanostructures, suitable for rapid measurement and characterization of thin film materials. Supports high compatibility and flexible configuration of multi angle, low light spot, visual leveling system, and customized design of multifunctional modules.
SE-VM 是一款超高精度快速测量光谱椭偏仪，其采用自主研发的椭偏创新技术，具备 1 双旋转补偿器同步控制技术，2 透明基底消背反技术 等技术。快速实现光学参数薄膜和纳米结构的表征分析，适用于薄膜材料的快速测量表征。支持多角度，微光斑，可视化调平系统等高兼容性灵活配置，多功能模块定制化设计。

主要附件及配置

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