主要规格及技术指标

1. Number of vacuum chambers: single chamber, stainless steel bucket shaped vertical structure, front door form
2. Vacuum chamber specification: Φ 600mm x H600mm
3. Extreme vacuum degree: ≤ 6.7 × 10-5Pa
4. Extraction rate: Starting from the atmosphere, it takes ≤ 40 minutes to evacuate to 9 × 10-4Pa
5. Static boosting: After the system stops pumping and shuts down for 12 hours, the vacuum degree is ≤ 5Pa
6. Electron beam evaporation unit configuration [TELEMARK 264-12/ST-6, USA]
Maximum power: 6KW
Anode voltage: -4KV~-10KV, continuously adjustable
Beam current: 0-600mA @ 10kV, 0-750mA @ 8kV
Electron beam deflection angle: 270 ° (e-type)
Beam spot scanning: The deflection current in the X and Y directions is adjustable to ± 1.5A, equipped with a handheld wired operation box
Number and capacity of crucibles: 6 15cc capacity crucibles with automatic baffles, crucibles can automatically rotate and position
7. Film thickness monitoring system:
Monitoring thickness display range: 0~99 μ 9999 Å
Thickness display res

主要功能及特色

This equipment is an electron beam evaporation high vacuum coating equipment, which can deposit various metal films, optical films, transparent conductive films, dielectric films, and other thin films. At the same time, the equipment can be equipped with a DC ion source, which can pre clean the sample before coating or assist in deposition during the coating process.
该设备为电子束蒸发高真空镀膜设备，可镀制各种金属薄膜、光学薄膜、透明导电薄膜、介质膜等薄膜。同时设备可以配备直流离子源，能够在镀膜前对样片进行预清洗或进行镀制过程中的辅助沉积。

主要附件及配置

无