主要规格及技术指标

测量值 反射率 R
分析与显示 薄膜厚度，折射率，吸收系数等
厚度测量范围 2 nm ... 50 µm
(取决于层数和基材)
准确率 <1 nm (400 nm SiO2/Si; 受参考标准限值)
精确性 0.3 nm (1 σ, 对于400 nm SiO2/Si)
测量时间 通常 300 ms
光谱范围 200 nm - 1000 nm
斑点大小 100 µm
光源 稳定氘和卤钨灯
检测器 SMA光纤输入光谱仪,
用于光谱强度测量的高性能光电二极管阵列
光谱分辨率: 5 nm FWHM,
像素分辨率: 0.45 nm
(可按要求提供其他分辨率)
样品台 固定样品台150mm样品平台，高度和倾斜可调，真空吸盘.
可选: 映射阶段
150 mm x 150 mm (电动, 分辨率: 5 µm, 精度: 2 µm),
200 mm x 200 mm (电动, 分辨率: 5 µm, 精度: 2 µm)
300 mm r, θ (电动; θ: 分辨率: 0,04°, 精度: 0.02°;
线性: 分辨率: 0,5 µm, 精度: 1,5 µm),
(其他样品根据需求)
样本对其 Auto-collimating telescope and optical microscope for sample alignment (height and tilt) 用于样品对准的自动准直望远镜和光学显微镜（高度和倾斜度）
用于ACT的摄像机，它还提供640 μ m x 400 μ m的标准物镜测量区域的图像
控制器 19” 控制器盒桌面箱, 6HE
电源 额定电压: 115 / 230 VAC 自动选择, 额定频率: 50-60 Hz, 额定功率: 360VA
重量 设备: 20 Kg + 电子器件: 12 kg
电脑连接 网络连接器RJ-45


Measured values Reflectivity R
Measured values Film thickness, refractive index, absorption, and more
Range of thickness measurement 2 nm ... 50 µm
(depends on layer and substrate)
Accuracy <1 nm (typ. for 400 nm SiO2/Si; limited by reference standard)
Precision 0.3 nm (1 σ, typ. for 400 nm SiO2/Si)
Measurement time typical 300 ms
Spectral range 200 nm - 1000 nm
Spot size 100 µm
Light source stabilised Deuterium and Halogen Tungsten lamp
Detector spectrometer with SMA fibre input,
high-performance photodiode array for spectral intensity measurement
Spectral resolution: 5 nm FWHM,
Pixel resolution: 0.45 nm
(other resolutions are available on request)
Sample stage Fixed sample stage with 150 mm sample platform, height- and tilt-adjustable, vacuum chuck.
Optional: mapping stages
150 mm x 150 mm (motorised, Resolution: 5 µm, Precision: 2 µm),
200 mm x 200 mm (motorised, Resolution: 5 µm, Precision: 2 µm)
300 mm r, theta (motorised; Theta: Resolution: 0,04°, Prec.: 0.02°; Linear: Resolution: 0,5 µm, Precision: 1,5 µm),
(other stages on request)
Sample alignment Auto-collimating telescope and optical microscope for sample alignment (height and tilt)
Video camera for ACT, it also gives a 640 µm x 400 µm picture of the measured area with standard objective
Controller 19” Controller box tabletop case, 6HE
Power requirement Rated voltage: 115 / 230 VAC auto select, Rated frequency: 50-60 Hz, Rated power: 360VA
Weight Device: 20 Kg + Electronics: 12 kg
Computer connection Network connector RJ-45

主要功能及特色

反射率测试仪RM 2000是一种光学反射测量仪器，用于在宽光谱范围内表征薄膜和块状材料。UV-VIS 反射率测试仪 RM 2000提供正常入射下的反射率光谱，由FTP Expert软件根据样品参数（如薄膜厚度、吸收、成分、能隙、颜色、光谱带宽等）进行分析。一个主要的应用是快速和便捷的厚度测量透明和吸收基板上的透明和半透明薄膜。它涵盖了从2纳米到50微米的薄膜厚度范围，由于庞大和可扩展的材料库，它可以应用于各种各样的材料系统。RM 2000反射率测量的原理是基于反射强度的测量，反射强度被归一化为参考样品的强度。参考样本是d的一部分。快速算法使光学测量和计算薄膜厚度具有高重复率成为可能。自动建模功能允许通过与光谱库进行比较来快速检测样品类型。UV-VIS Reflectometer RM 2000包括带有样品台和光学装置的台式显微镜单元，用于照明样品的一个相对较小的点并检测反射光。此外，它还包括样品对准装置，该装置包括用于精确控制样品的高度和倾斜的自动准直望远镜和显微镜物镜。电子盒包含一个嵌入式微控制器和一个光谱仪。电子盒可以通过以太网LAN连接与运行在Windows下的任意PC相连。UV-VIS Reflectometer RM 2000可选择配备一个计算机控制的XY - mapping stage来横向扫描样品属性。绘图软件允许定义任何类型的测量模式，在2D和3D图中显示结果，并对样本进行统计。用户软件易于操作，并以清晰的方式呈现测量结果。它支持单层厚度测量和层堆分析。该软件提供现成的和用户定义的应用程序。

The Spectroscopic Tabletop Reflectometer RM 2000 is an optical reflection measurement instrument for the characterization of thin films and bulk material in a broad spectral range.
The UV-VIS Reflectometer RM 2000 provides reflectivity spectra at normal incidence which are analyzed by the FTP Expert software according to the sample parameters like film thickness, absorption, composition, energy gap, color, spectral bandwidth, and more.
A major application is the fast and easy thickness measurement of transparent and semitransparent films on transparent and absorbing substrates. It covers a film thickness range from 2 nm to 50 microns and can be applied to a high variety of material systems due to the large and extensible material library.
The principle of the RM 2000 reflectivity measurement is based on the measurement of the reflected intensity which is normalized to an intensity taken at a reference sample. The reference sample is part of the delivery.
Fast algorithms make it possible to perform optical measurements and the calculation of the film thickness with a high repetition rate. The Auto Modeling feature allows fast detections of sample types by comparison with a spectrum library.
The UV-VIS Reflectometer RM 2000 comprises the tabletop microscope unit with sample stage and optical setup for the illumination of a relatively small spot of the sample and detection of the reflected light. Further, it comprises a sample alignment arrangement consisting of an auto-collimating telescope and a microscope objective for the exact control of the height and tilt of the sample. The electronics box contains an embedded microcontroller and a spectrometer. The electronics box can be interfaced with any state-of-the-art PC running under Windows via an Ethernet LAN connection.
The UV-VIS Reflectometer RM 2000 can be optionally equipped with a computer-controlled XY – mapping stage to scan the sample properties laterally. The mapping software allows for defining any kind of measurement pattern, displaying the results in 2D and 3D plots, and to perform statistics over the sample.
The user software is easy to handle and presents the measurement result in a clear way. It supports the thickness measurement of single layers as well as the analysis of layer stacks. The software offers ready and user-defined applications.

主要附件及配置

1 反射率测试仪 Spectroscopic Reflectometer RM 2000 1
2 薄膜标准片 SE K400 Thin film test wafer SE K400 1
3 自动扫描选项 SER 16 Mapping option SER 16 1