主要规格及技术指标

匀胶机使用环境
1、1000级以上洁净室；
2、室温在20°C～25°C；
3、湿度在40%～50%

The operating environment for the spin coater is as follows:
1.A cleanroom with a class of 1000 or higher
2.Room temperature maintained between 20°C and 25°C;
3.Humidity maintained between 40% and 50%.

主要功能及特色

RC-200型匀胶机适用于半导体、硅片、晶片、基片、导电玻璃及制版等表面涂覆工艺，可在工矿企业、科研院校等单位作生产、科研、教学之用。RC-150/RC-200型匀胶机工作原理是在真空吸盘上高速旋转基片，利用离心力使滴在基片上的胶液均匀的涂在基片上，厚度视不同胶液和基片间的粘滞系数而不同，也和旋转速度及时间有关

The RC-200 spin coater is suitable for surface coating processes on semiconductors, silicon wafers, crystal wafers, substrates, conductive glass, and plate making. It can be used for production, research, and teaching in industrial and mining enterprises, research institutes, and universities. The working principle of the RC-150/RC-200 spin coater involves spinning the substrate at high speed on a vacuum chuck, utilizing centrifugal force to evenly spread the adhesive dropped onto the substrate. The thickness of the coating varies depending on the viscosity coefficient between the adhesive and the substrate, as well as the rotation speed and duration.

主要附件及配置

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