主要规格及技术指标

关键技术指标
曝光参数：
光源：LED，波长405 nm
数字掩膜版分辨率：1920x1080像素
特征尺寸：0.8μm
最小等间距线栅：1.0μm
观测镜头：2.6mm x 1.7mm
光刻镜头1：20mm²/min，工作距离19mm
光刻镜头2：3mm²/min，工作距离12mm
套刻精度：5mm x 5mm范围内400nm，50mm x 50mm范围内1000nm（全局畸变矫正算法）
支持基片尺寸：最大150mm x 150mm x 10mm
设备尺寸：设备主体：74cm（长）x 71cm（宽）x 65cm（高）
设备重量：153kg

安装要求
温度：20-40℃
湿度：RH < 60%
电源：220V，50Hz

Key Technical Specifications
- Exposure Parameters:
- Light source: LED, wavelength 405 nm
- Digital mask resolution: 1920x1080 pixels
- Feature size: 0.8μm
- Minimum line grating spacing: 1.0μm
- Observation lens: 2.6mm x 1.7mm
- Lithography lens 1: 20mm²/min, working distance 19mm
- Lithography lens 2: 3mm²/min, working distance 12mm
- Overlay accuracy: 400nm within 5mm x 5mm, 1000nm within 50mm x 50mm (global distortion correction algorithm)
- Supported Substrate Size: Maximum 150mm x 150mm x 10mm
- Equipment Dimensions: Main body: 74cm (length) x 71cm (width) x 65cm (height)
- Equipment Weight: 153kg

Installation Requirements
- Temperature: 20-40°C
- Humidity: RH < 60%
- Power Supply: 220V, 50Hz

主要功能及特色

技术特点：
步进式光刻、多镜头电动切换、极致的灵活性、6英寸加工幅面、特征尺寸0.8μm

应用示例
适用于多种微纳加工领域，包括：集成电路（IC）、微机电系统（MEMS）器件（a）、多级衍射透镜、TUOTUO LOGO、MEMS器件（b）、金字塔、微流控芯片、光栅

硬件功能
照明光源：支持显微观测且不会引起光刻胶变性
对焦模式：图像识别对焦
样品操作：支持样品旋转
其他：可升级为电动版本，支持灰度光刻功能（选配）

软件功能
套刻辅助：交互式套刻指引功能
原位光绘：支持原位绘制光刻图形
物像绑定：支持样品图形和光刻图形绑定，实时对应
成像拼接：支持样品图形的大范围拼接，实现大范围样品查找
畸变矫正：支持光刻图形算法畸变矫正，实现精准套刻

Technical Features:
- Step-by-step lithography
- Multi-lens motorized switching
- Ultimate flexibility
- 6-inch processing area
- Feature size of 0.8μm

Application Examples
- Suitable for various micro-nano processing fields, including:
- Integrated Circuits (IC)
- Micro-Electro-Mechanical Systems (MEMS) devices (a)
- Multi-level diffraction lenses
- TUOTUO Logo
- MEMS devices (b)
- Pyramids
- Microfluidic chips
- Gratings

Hardware Features
- Illumination Source: Supports microscopic observation without causing photoresist degeneration
- Focusing Mode: Image recognition focusing
- Sample Operation: Supports sample rotation
- Other: Upgradable to motorized version, supports grayscale lithography function (optional)

Software Features
- Overlay Assistance: Interactive overlay guidance function
- In-situ Photolithography: Supports in-situ drawing of lithographic patterns
- Object-Image Binding: Supports binding of sample graphics and lithographic patterns, real-time correspondence
- Imaging Stitching: Supports large-scale stitching of sample graphics for wide-area sample search
- Distortion Correction: Supports algorithmic distortion correction of lithographic patterns for precise overlay

主要附件及配置

电脑主机型号Computer host model:HP Z1 G9 Tower Desktop PC
电脑主机SN Computer host SN:4CE345CDHK ;
显示器型号Computer Monitor model:272S9B/93
显示器SN Computer Monitor SN:UK02412010968744